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Semiconductor devices - Micro-electromechanical devices - Part 40:Test methods of micro-electromechanical inertial shock switch threshold

60.60 Standard published

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 41: RF MEMS circulators and isolators

60.60 Standard published

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS

60.60 Standard published

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 42: Measurement methods of electro-mechanical conversion characteristics of piezoelectric MEMS cantilever

60.60 Standard published

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 43: Test method of electrical characteristics after cyclic bending deformation for flexible micro-electromechanical devices

60.60 Standard published

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 44: Test methods for dynamic performances of MEMS resonant electric-field-sensitive devices

60.60 Standard published

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 45: Silicon based MEMS fabrication technology - Measurement method of impact resistance of nanostructures

50.00 Final text received or FDIS registered for formal approval

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 46: Silicon based MEMS fabrication technology - Measurement method of tensile strength of nanoscale thickness membrane

50.00 Final text received or FDIS registered for formal approval

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 47: Silicon based MEMS fabrication technology - Measurement method of bending strength of microstructures

50.00 Final text received or FDIS registered for formal approval

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 48: Test method for determining solution concentration by optical absorption using MEMS fluidic device

60.00 Standard under publication

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 49: Reliability test methods of electro-mechanical conversion characteristics of piezoelectric MEMS cantilever

30.99 CD approved for registration as DIS

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS

30.99 CD approved for registration as DIS

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 50: MEMS capacitive microphone

30.20 CD study/ballot initiated

TC 47/SC 47F

Corrigendum 1 - Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches

60.60 Standard published

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches

60.60 Standard published

TC 47/SC 47F

Semiconductor Devices - Micro-electromechanical Devices - Part 52: Biaxial tensile testing method for stretchable MEMS

20.99 WD approved for registration as CD

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 53: MEMS electrothermal transfer device

20.99 WD approved for registration as CD

TC 47/SC 47F

Semiconductor devices - Micro-electromechanical devices - Part 6: Axial fatigue testing methods of thin film materials

60.60 Standard published

TC 47/SC 47F