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Surface chemical analysis — Electron spectroscopies — Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
90.93 Standard confirmed
Surface chemical analysis — Total reflection X-ray fluorescence analysis of water
90.92 Standard to be revised
Surface chemical analysis — Secondary-ion mass spectrometry — Method for estimating depth resolution parameters with multiple delta-layer reference materials
90.93 Standard confirmed
Surface chemical analysis — Secondary ion mass spectrometry — Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
90.92 Standard to be revised
Surface chemical analysis — Sample handling, preparation and mounting — Part 3: Biomaterials
60.60 Standard published
Surface chemical analysis — Guidelines to sample handling, preparation and mounting — Part 4: Reporting information related to the history, preparation, handling and mounting of nano-objects prior to surface analysis
90.93 Standard confirmed
Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results
90.20 Standard under periodical review
Chemical analysis of refractories containing alumina, zirconia and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 1: Apparatus, reagents and dissolution
90.93 Standard confirmed
Chemical analysis of refractories containing alumina, zirconia, and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 2: Wet chemical analysis
90.93 Standard confirmed
Chemical analysis of refractories containing alumina, zirconia, and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 3: Flame atomic absorption spectrophotometry (FAAS) and inductively coupled plasma emission spectrometry (ICP -AES)
90.93 Standard confirmed
Surface chemical analysis — Scanning probe microscopy — Procedure for the determination of elastic moduli for compliant materials using atomic force microscope and the two-point JKR method
60.60 Standard published
Surface chemical analysis — X-ray photoelectron and Auger electron spectrometers — Linearity of intensity scale
90.93 Standard confirmed
Surface chemical analysis — Information format for static secondary-ion mass spectrometry
90.93 Standard confirmed
Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
90.20 Standard under periodical review
Surface chemical analysis — Near real-time information from the X-ray photoelectron spectroscopy survey scan — Rules for identification of, and correction for, surface contamination by carbon-containing compounds
60.60 Standard published
Surface chemical analysis — Measurement of lateral and axial resolutions of a Raman microscope
60.60 Standard published
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
60.60 Standard published
Surface chemical analysis — Atomic force microscopy — Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size
60.60 Standard published
