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ISO 23170:2022

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering ISO 23170:2022

Publication date:   Jun 15, 2022

General information

60.60 Standard published   Jun 15, 2022

ISO

ISO/TC 201/SC 4 Depth profiling

International Standard

71.040.40   Chemical analysis

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This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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PUBLISHED
ISO 23170:2022
60.60 Standard published
Jun 15, 2022