CEN/TR 10353:2011

Chemical analysis of ferrous materials - Analysis of ferro-silicon - Determination of Al, Ti and P by inductively coupled plasma optical emission spectrometry CEN/TR 10353:2011

Publication date:   Jan 18, 2012

Scope

This Technical Report describes an inductively coupled plasma optical emission spectrometric method for the determination of Al, Ti and P contents in Ferro Silicon materials.
The method is applicable to:
- Al content between 0,2 and 2 %;
- Ti content between 0,02 and 0,25 %;
- P content between 0,005 and 0,05 %.
This Technical Report also describes the general requirements for analysis by inductively coupled plasma optical emission spectrometry, the preparation and dissolution of the test sample and the method of calculation of the results.
The procedure is valid for the analytical lines given in Table 1. This table also gives, for each line, the spectral interferences, which must be accurately corrected.
NOTE The interferences extend as well as other possible interferences depend on the temperature in the plasma and on the optical resolution of the spectrometer used.
Table 1 - Spectral lines suggested together with the interferences which shall be corrected
Element Wavelength (nm) Interferences
Al 308,22 V
Ti 337,28 V, Ni
P 178,29 Mo