ISO/TS 25138:2010

Surface chemical analysis — Analysis of metal oxide films by glow-discharge optical-emission spectrometry ISO/TS 25138:2010

Publication date:   Nov 22, 2010

Scope

ISO/TS 25138:2010 describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films.
The method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn and Al. Other elements that can be determined by the method are O, C, N, H, P and S.