90.93 Standard confirmed Oct 4, 2024
ISO
ISO/TC 206 Fine ceramics
International Standard
81.060.30 Advanced ceramics
Published
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
PUBLISHED
ISO 21859:2019
90.93
Standard confirmed
Oct 4, 2024