0

ISO 21466:2019

Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM ISO 21466:2019

Publication date:   Dec 13, 2019

General information

60.60 Standard published   Dec 13, 2019

ISO

ISO/TC 202/SC 4 Scanning electron microscopy

International Standard

37.020   Optical equipment

Buying

Published

Language in which you want to receive the document.

Scope

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

Life cycle

NOW

PUBLISHED
ISO 21466:2019
60.60 Standard published
Dec 13, 2019