ISO 14606:2015

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials ISO 14606:2015

Publication date:   Dec 1, 2015

Scope

ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.