IEC 62047-54 ED1

Semiconductor devices - Micro-electromechanical devices - Part 54: Silicon based MEMS fabrication technology – Measurement method of tensile strength of microstructures

Current stage: 40.20 DIS ballot initiated: 12 weeks Jul 31, 2026

Next stage: PRVC Next stage date : Oct 23, 2026

Originator: IEC

Type: International Standard

ICS: 31.080.99 Other semiconductor devices

IN_DEVELOPMENT
IEC 62047-54 ED1
40.20 DIS ballot initiated: 12 weeks
Jul 31, 2026