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Use the form below to find particular standards or projects. Enter your criteria for searching (single or in combination) in the fields below and press the button “Search”. You can also search using the Advance Search facility.
Surface chemical analysis — X-ray photoelectron spectroscopy — Guidelines for analysis
60.60 Standard published
Surface chemical analysis — Scanning-probe microscopy — Measurement of drift rate
90.93 Standard confirmed
Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
90.92 Standard to be revised
Surface chemical analysis — Scanning-probe microscopy — Determination of cantilever normal spring constants
90.93 Standard confirmed
Surface chemical analysis — Scanning-probe microscopy — Determination of geometric quantities using SPM: Calibration of measuring systems
90.20 Standard under periodical review
Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of arsenic in silicon
90.93 Standard confirmed
Gas analysis — Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration
90.60 Close of review
Gas analysis — Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration — Amendment 1: Correction to Formula 5
60.60 Standard published
Surface chemical analysis — Scanning probe microscopy — Standards on the definition and calibration of spatial resolution of electrical scanning probe microscopes (ESPMs) such as SSRM and SCM for 2D-dopant imaging and other purposes
90.93 Standard confirmed
Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
90.60 Close of review
Surface Chemical Analysis — Atomic force microscopy — Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement
90.93 Standard confirmed
Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis
90.93 Standard confirmed
Gas analysis — General quality aspects and metrological traceability of calibration gas mixtures
90.60 Close of review
Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
90.93 Standard confirmed
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
60.60 Standard published
Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
90.60 Close of review
Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
90.93 Standard confirmed
Surface chemical analysis — Glow discharge optical emission spectrometry (GD-OES) — Introduction to use
60.60 Standard published