ISO/NP 16538

Stationary source emissions — Determination of volume flowrate and concentration of fluorinated compounds (FCs) and N2O in ducts of semiconductor and display processes ISO/NP 16538

General information

10.98 New project rejected   Jun 9, 2022

ISO

ISO/TC 146/SC 1 Stationary source emissions

International Standard

Scope

This International Standard provides a method for determining the volume flowrate of fluorinated compounds (FCs) greenhouse gases such as CF4, NF3, SF6, and N2O, which are used in the semiconductor and display processes such as etching, chemical vapour deposition (CVD), etc. It uses two measuring equipment, including quadrupole mass spectrometer (QMS) to determine the total volume flow rate of exhaust gas from the process and Fourier-transform infrared spectroscopy (FTIR) for determining the concentration of FCs and N2O in the duct.

Life cycle

NOW

ABANDON
ISO/NP 16538
10.98 New project rejected
Jun 9, 2022