Standards search

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Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

90.93 Standard confirmed

ISO/TC 201

Evaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reporting

60.60 Standard published

ISO/TC 201

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

90.93 Standard confirmed

ISO/TC 201

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1

60.60 Standard published

ISO/TC 201

Surface chemical analysis — Surface characterization — Measurement of the lateral resolution of a confocal fluorescence microscope

90.93 Standard confirmed

ISO/TC 201

Surface chemical analysis — Measurement of lateral and axial resolutions of a Raman microscope

60.60 Standard published

ISO/TC 201

Surface chemical analysis — Determination of the minimum detectability of surface plasmon resonance device

60.60 Standard published

ISO/TC 201

SCA –Surface chemical analysis of bacteria and biofilms

20.00 New project registered in TC/SC work programme

ISO/TC 201

Surface chemical analysis — Characterization of functional glass substrates for biosensing applications

60.60 Standard published

ISO/TC 201

Surface chemical analysis — Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis

90.93 Standard confirmed

ISO/TC 201