ISO 14706:2014

Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Publication date:   Jul 25, 2014

General information

90.93 Standard confirmed   Jun 17, 2021

ISO

ISO/TC 201 Surface chemical analysis

International Standard

71.040.40   Chemical analysis

Buying

Published

Language in which you want to receive the document.

Scope

ISO 14706:2014 specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to the following: elements of atomic number from 16 (S) to 92 (U); contamination elements with atomic surface densities from 1 × 1010 atoms/cm2 to 1 × 1014 atoms/cm2; contamination elements with atomic surface densities from 5 × 108 atoms/cm2 to 5 × 1012 atoms/cm2 using a VPD (vapour-phase decomposition) specimen preparation method.

Life cycle

PREVIOUSLY

Revises
ISO 14706:2000

NOW

PUBLISHED
ISO 14706:2014
90.93 Standard confirmed
Jun 17, 2021